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Structural and electrical properties of ion beam sputter deposited tantalum films

Structural and electrical properties of ion beam sputter deposited tantalum films

F. Sajovec; P.M. Meuffels; T. Schober
  • 作者F. Sajovec; P.M. Meuffels; T. Schober
  • 卷第219卷
  • 印刷ISSN0040-6090
  • 文件大小341.70KB
  • 发表时间1992
  • DOI10.1016/0040-6090(92)90744-v
  • 页码206-209
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