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Self-limiting behavior of the growth of Al2O3 using sequential vapor pulses of TMA and H2O2

Self-limiting behavior of the growth of Al2O3 using sequential vapor pulses of TMA and H2O2

Jia-Fa Fan; Koichi Toyoda
  • 作者Jia-Fa Fan; Koichi Toyoda
  • 印刷ISSN0169-4332
  • 文件大小647.94KB
  • 发表时间1992
  • DOI10.1016/0169-4332(92)90510-5
  • 页码765-769
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