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Hydrogen termination of the NH4F-treated Si(111) surface studied by photoemission and surface infrared spectroscopy

Hydrogen termination of the NH4F-treated Si(111) surface studied by photoemission and surface infrared spectroscopy

Niwano, M.; Takeda, Y.; Kurita, K.; Miyamoto, N.

期刊名称Journal of Applied Physics
作者Niwano, M.; Takeda, Y.; Kurita, K.; Miyamoto, N.
卷第72卷
期第6期
印刷ISSN0021-8979
文件大小753.04KB
发表时间1992
DOI10.1063/1.351541

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