Kinetic Calculations in Plasmas Used for Diamond Deposition
- 期刊名称Japanese Journal of Applied Physics
- 作者Bou, Pierre; Boettner, Jean Claude; Vandenbulcke, Lionel
- 卷第31卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小819.37KB
- 发表时间1992-5-15
- DOI10.1143/JJAP.31.1505
- 页码1505-1513
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