Improvement in the Activation Efficiency of Implanted Si in GaAs using Oxygen Plasma Pretreatment
- 期刊名称MRS Proceedings
- 作者Cho, Jaeshin; Pawlowicz, Leszek M.; Saha, Naresh C.
- 卷第259卷
- 电子ISSN1946-4274
- 文件大小436.60KB
- 发表时间1992-1
- DOI10.1557/proc-259-311
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