SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Poly(p-trimethylgermylstyrene sulfone)s as a high-resolution electron-beam resist
- 作者Kim, Seong-Ju; Park, Byung-Sun; Lee, Haiwon; Novembre, Anthony E.
- 卷第1672卷
- 印刷ISSN0277-786X
- 文件大小317.02KB
- 发表时间1992
- DOI10.1117/12.59767
- 页码477-485
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