Glove Permeation by Propylene Glycol Monomethyl Ether Acetate — A Photoresist Solvent Used in Semiconductor Device Processing
- 期刊名称Applied Occupational and Environmental Hygiene
- 作者Zellers, Edward T.; Sulewski, Robert
- 卷第7卷
- 期第6期
- 印刷ISSN1047-322X
- 电子ISSN1521-0898
- 文件大小791.01KB
- 发表时间1992-06
- DOI10.1080/1047322x.1992.10390177
- 页码392-397
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