The oxidation of polycrystalline silver films by thermal, ground-state atomic oxygen
- 作者D.L. Edwards; J.R. Williams; A.T. Fromhold; P.A. Barnes; J.P. Wey; W.C. Neely; A.F. Whitaker
- 卷第79卷
- 印刷ISSN0168-583X
- 文件大小386.70KB
- 发表时间1993
- DOI10.1016/0168-583x(93)95441-7
- 页码676-679
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