Effects of electron beam during ion implantation and ion beam assisted deposition
- 期刊名称Applied Physics Letters
- 作者Liu, Xianghong; Ma, Tengcai
- 卷第63卷
- 期第14期
- 印刷ISSN0003-6951
- 文件大小488.39KB
- 发表时间1993
- DOI10.1063/1.110642
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