发现好书期刊,享受阅读乐趣

海量图书期刊资源,随时随地畅享阅读乐趣

SPIE Proceedings [SPIE Microelectronic Processing '93 - Monterey, CA (Sunday 26 September 1993)] Microelectronic Processes, Sensors, and Controls - Native oxide removal on Si surface by NF 3 -added hydrogen plasma downstream treatment

SPIE Proceedings [SPIE Microelectronic Processing '93 - Monterey, CA (Sunday 26 September 1993)] Microelectronic Processes, Sensors, and Controls - Native oxide removal on Si surface by NF 3 -added hydrogen plasma downstream treatment

Kikuchi, Jun; Bondur, James A.; Elliott, Kiefer; Iga, Masao; Fujimura, Shuzo; Hauser, John R.; Kwong, Dim-Lee; Yano, Hiroshi; Ray, Asit K.
  • 作者Kikuchi, Jun; Bondur, James A.; Elliott, Kiefer; Iga, Masao; Fujimura, Shuzo; Hauser, John R.; Kwong, Dim-Lee; Yano, Hiroshi; Ray, Asit K.
  • 卷第2091卷
  • 印刷ISSN0277-786X
  • 文件大小243.21KB
  • 发表时间1993
  • DOI10.1117/12.167335
← 返回【学霸图书馆】主页