Effects of substrate temperature and V/III flux ratio on the growth of InAIAs on InP substrates by molecular beam epitaxy

• 作者S.F. Yoon; Y.B. Miao; K. Radhakrishnan; S. Swaminathan
• 卷第144卷
• 印刷ISSN0022-0248
• 文件大小416.03KB
• 发表时间1994
• DOI10.1016/0022-0248(94)90446-4
• 页码121-125