Model for amorphization processes in ion-implanted Si
- 期刊名称Physical Review B
- 作者Motooka, Teruaki
- 卷第49卷
- 期第23期
- 印刷ISSN0163-1829
- 电子ISSN1095-3795
- 文件大小523.36KB
- 发表时间1994-6-15
- DOI10.1103/PhysRevB.49.16367
- 页码16367-16371
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