Optical in-situ analysis of GaAs/AlAs/GaAs and GaAs/(Al)GaAs/GaAs atomic layer growth using GaCl3, AlCl3 and AsH3
- 作者M. Akamatsu; S. Narahara; T. Kobayashi; F. Hasegawa
- 印刷ISSN0169-4332
- 文件大小421.80KB
- 发表时间1994
- DOI10.1016/0169-4332(94)90221-6
- 页码228-232
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