Comparison of advanced plasma sources for etching applications. II. Langmuir probe studies of a helicon and a multipole electron cyclotron resonance source

• 期刊名称Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• 作者Tepermeister, I.
• 卷第12卷
• 期第4期
• 印刷ISSN0734-211X
• 文件大小960.23KB
• 发表时间1994-7
• DOI10.1116/1.587759