Triple-crystal x-ray diffraction analysis of reactive ion etched gallium arsenide
- 期刊名称Journal of Applied Physics
- 作者Wang, V. S.; Matyi, R. J.; Nordheden, K. J.
- 卷第75卷
- 期第8期
- 印刷ISSN0021-8979
- 文件大小1181.91KB
- 发表时间1994
- DOI10.1063/1.356062
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