Applications of MeV Ion Implantation in Semiconductor Device Manufacturing
- 期刊名称MRS Proceedings
- 作者Borland, John O.
- 卷第354卷
- 电子ISSN1946-4274
- 文件大小945.15KB
- 发表时间1994-1
- DOI10.1557/proc-354-123
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