Silicide formation in the Co-Si system by rapid thermal annealing
- 作者Joshua Pelleg; S. Zalkind; L. Zevin; B.M. Ditchek
- 卷第249卷
- 期第1期
- 印刷ISSN0040-6090
- 文件大小506.24KB
- 发表时间1994
- DOI10.1016/0040-6090(94)90097-3
- 页码126-131
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