Surface X-ray diffraction study on the Si(001)2 × 1 structure
M. Takahasi; S. Nakatani; Y. Ito; T. Takahashi; X.W. Zhang; M. Ando
- 作者M. Takahasi; S. Nakatani; Y. Ito; T. Takahashi; X.W. Zhang; M. Ando
- 卷第338卷
- 印刷ISSN0039-6028
- 文件大小398.30KB
- 发表时间1995
- DOI10.1016/0039-6028(95)00663-x