Anomalous depth distributions of bulk microdefects in heat-treated Czochralski silicon wafers due to nonequilibrium self-interstitials
- 作者Y. Satoh; H. Furuya; M. Kadoi; Y. Shimanuki
- 文件大小2099.95KB
- 发表时间1995
- DOI10.1063/1.358610
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