SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - Proximity correction for e-beam lithography
Marrian, Christie R.; Chang, Steven; Peckerar, Martin C.; Shelden, Gilbert V.; Wiley, James N.
- 作者Marrian, Christie R.; Chang, Steven; Peckerar, Martin C.; Shelden, Gilbert V.; Wiley, James N.
- 卷第2621卷
- 印刷ISSN0277-786X
- 文件大小869.51KB
- 发表时间1995
- DOI10.1117/12.228169
- 页码2-13