SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - Hierarchical proximity correction using CAPROX
Hofmann, Ulrich; Kalus, Christian K.; Rosenbusch, Anja; Endo, Hiroyuki; Kimura, Yasuki; Endo, Akihiro; Shelden, Gilbert V.; Wiley, James N.
- 作者Hofmann, Ulrich; Kalus, Christian K.; Rosenbusch, Anja; Endo, Hiroyuki; Kimura, Yasuki; Endo, Akihiro; Shelden, Gilbert V.; Wiley, James N.
- 卷第2621卷
- 印刷ISSN0277-786X
- 文件大小521.20KB
- 发表时间1995
- DOI10.1117/12.228210
- 页码558-567