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Theoretical investigation of adsorption behavior during molecular beam epitaxy growth of GaAs: Ab initio based microscopic calculation

Theoretical investigation of adsorption behavior during molecular beam epitaxy growth of GaAs: Ab initio based microscopic calculation

Shiraishi, K
  • 期刊名称Journal of Crystal Growth
  • 作者Shiraishi, K
  • 卷第150卷
  • 印刷ISSN0022-0248
  • 文件大小384.08KB
  • 发表时间1995-5
  • DOI10.1016/0022-0248(94)00707-1
  • 页码158-162
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