Deposition of aluminum nitride thin films by MOCVD from the trimethylaluminum–ammonia adduct

• 作者Prof. Anthony C. Jones; Simon A. Rushworth; Dr. David J. Houlton; Dr. John S. Roberts; Dr. Victoria Roberts; Prof. Colin R. Whitehouse; Gary W. Critchlow
• 卷第2卷
• 期第1期
• 印刷ISSN0948-1907
• 电子ISSN1521-3862
• 文件大小479.78KB
• 发表时间1996
• DOI10.1002/cvde.19960020102
• 页码5-8