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The Effect of Gas-Phase Additives C[sub 2]H[sub 4], C[sub 2]H[sub 6], and C[sub 2]H[sub 2] on SiH[sub 4]∕O[sub 2] Chemical Vapor Deposition

The Effect of Gas-Phase Additives C[sub 2]H[sub 4], C[sub 2]H[sub 6], and C[sub 2]H[sub 2] on SiH[sub 4]∕O[sub 2] Chemical Vapor Deposition

Takahashi, T.

期刊名称Journal of The Electrochemical Society
作者Takahashi, T.
卷第143卷
期第4期
印刷ISSN0013-4651
文件大小1638.31KB
发表时间1996
DOI10.1149/1.1836642

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