The effect of microwave power on the deposition of boron-doped aSiC:H films using the electron cyclotron resonance method
S.F. Yoon; R. Ji; J. Ahn; W.I. Milne
- 作者S.F. Yoon; R. Ji; J. Ahn; W.I. Milne
- 卷第288卷
- 印刷ISSN0040-6090
- 文件大小260.50KB
- 发表时间1996
- DOI10.1016/s0040-6090(96)08803-7
- 页码155-159