[Japan Soc. Appl. Phys International Conference on Simulation of Semiconductor Processes and Devices - Tokyo, Japan (2-4 Sept. 1996)] 1996 International Conference on Simulation of Semiconductor Processes and Devices. SISPAD '96 (IEEE Cat. No.96TH8095) - Computational performance of level set methods for etching, deposition, and lithography development
- 作者Adalsteinsson, D.; Sethian, J.A.
- 文件大小167.90KB
- 发表时间1996
- DOI10.1109/SISPAD.1996.865281
- 页码79-80
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