Seventy-nm-Pitch Patterning on CaF
2
by e-beam Exposure
Hongo, Hiroo; Hattori, Tetsuya; Miyamoto, Yasuyuki; Furuya, Kazuhito; Matsunuma, Takeshi; Watanabe, Masahiro; Asada, Masahiro
- 期刊名称Japanese Journal of Applied Physics
- 作者Hongo, Hiroo; Hattori, Tetsuya; Miyamoto, Yasuyuki; Furuya, Kazuhito; Matsunuma, Takeshi; Watanabe, Masahiro; Asada, Masahiro
- 卷第35卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小767.39KB
- 发表时间1996-12-15
- DOI10.1143/JJAP.35.6342
- 页码6342-6343