Interstitial Defect Reactions In Silicon
- 期刊名称MRS Proceedings
- 作者Zhao, S.; Agarwal, A. M.; Benton, J. L.; Gilmer, G. H.; Kimerling, L. C.
- 卷第442卷
- 电子ISSN1946-4274
- 文件大小406.25KB
- 发表时间1996-1
- DOI10.1557/proc-442-231
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