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The Influence of Hydrogen Dilution and Substrate Temperature in Hot-Wire Deposition of Amorphous and Microcrystalline Silicon With Filament Temperatures Between 1900 And 2500 °C

The Influence of Hydrogen Dilution and Substrate Temperature in Hot-Wire Deposition of Amorphous and Microcrystalline Silicon With Filament Temperatures Between 1900 And 2500 °C

Conde, J. P.; Brogueira, P.; Castanha, R.; Chu, V.

期刊名称MRS Proceedings
作者Conde, J. P.; Brogueira, P.; Castanha, R.; Chu, V.
卷第420卷
电子ISSN1946-4274
文件大小385.57KB
发表时间1996-1
DOI10.1557/proc-420-357

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