Inert Gas Dilution and Ion Bombardment Effects in Room Temperature (35°C) Plasma Deposition of a-Si:H
- 期刊名称MRS Proceedings
- 作者Srinivasan, Easwar; Lloyd, Daniel A.; Fang, Ming; Parsons, Gregory N.
- 卷第420卷
- 电子ISSN1946-4274
- 文件大小969.68KB
- 发表时间1996-1
- DOI10.1557/proc-420-399
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