SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Metrology, Inspection, and Process Control for Microlithography X - Development of critical dimension measurement scanning electron microscope for ULSI (S-8000 series)
- 作者Ezumi, Makoto; Otaka, Tadashi; Mori, Hiroyoshi; Todokoro, Hideo; Ose, Yoichi; Jones, Susan K.
- 卷第2725卷
- 印刷ISSN0277-786X
- 文件大小570.87KB
- 发表时间1996
- DOI10.1117/12.240146
- 页码105-113
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