Atomic layer controlled deposition of Al2O3 films using binary reaction sequence chemistry
- 作者A.W. Ott; K.C. McCarley; J.W. Klaus; J.D. Way; S.M. George
- 卷第107卷
- 印刷ISSN0169-4332
- 文件大小779.18KB
- 发表时间1996
- DOI10.1016/s0169-4332(96)00503-x
- 页码128-136
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