Negative photoresists for optical lithography
- 作者J. M. Shaw; J. D. Gelorme; N. C. Labianca; W. E. Conley; S. J. Holmes
- 卷第41卷
- 期第1期
- 文件大小1609.72KB
- 发表时间1997
- DOI10.1147/rd.411.0081
- 页码81-94
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