Effect of process parameters on glow discharge and film thickness uniformity in facing target sputtering
- 作者S. Senthil Nathan; G.K. Muralidhar; G. Mohan Rao; S. Mohan
- 卷第292卷
- 印刷ISSN0040-6090
- 文件大小459.61KB
- 发表时间1997
- DOI10.1016/s0040-6090(96)08928-6
- 页码20-25
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