Influence of oxygen pressure on the physical properties of dc magnetron reactive sputtered cadmium oxide films

• 作者T.K. Subramanyam; B Radha Krishna; S Uthanna; B.S. Naidu; P.J. Reddy
• 卷第48卷
• 期第6期
• 印刷ISSN0042-207X
• 文件大小509.68KB
• 发表时间1997
• DOI10.1016/s0042-207x(97)00019-5
• 页码565-569