Real-Time Kinetic Analysis of Hydrogen Abstraction and Etching Reactions Using Pulsed-Gas PECVD of Amorphous and Microcrystalline Silicon

• 期刊名称MRS Proceedings
• 作者Srinivasan, Easwar; Parsons, Gregory N.
• 卷第467卷
• 电子ISSN1946-4274
• 文件大小367.43KB
• 发表时间1997-1
• DOI10.1557/proc-467-501