SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Metrology, Inspection, and Process Control for Microlithography XI - Resist and etched line profile characterization using scatterometry
- 作者Raymond, Christopher J.; Naqvi, S. Sohail H.; McNeil, John R.; Jones, Susan K.
- 卷第3050卷
- 印刷ISSN0277-786X
- 文件大小1217.80KB
- 发表时间1997
- DOI10.1117/12.275944
- 页码476-486