SPIE Proceedings [SPIE Photomask Japan '97 - Kawasaki City, Japan (Thursday 17 April 1997)] Photomask and X-Ray Mask Technology IV - Thin resist performance comparison for advanced e-beam reticle fabrication
- 作者Kobayashi, Hideo; Higuchi, Takao; Asakawa, Keishi; Yokoya, Yasunori; Yamashiro, Kazuhide; Aizaki, Naoaki
- 卷第3096卷
- 印刷ISSN0277-786X
- 文件大小779.52KB
- 发表时间1997
- DOI10.1117/12.277277
- 页码19-36