[IEEE European Workshop Materials for Advanced Metallization. MAM'97 Abstracts Booklet - Villard de Lans, France (1997.03.16-1997.03.19)] European Workshop Materials for Advanced Metallization, - Copper CMP evaluation: slurry chemical effect on planarization
- 作者Romagna, F.; Fayolle, M.
- 文件大小167.59KB
- 发表时间1998
- DOI10.1109/mam.1998.887502
- 页码32-35
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