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[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Highly robust ultra-thin gate dielectric for giga scale technology

[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Highly robust ultra-thin gate dielectric for giga scale technology

Khare, M.; Wang, X.W.; Ma, T.P.

作者Khare, M.; Wang, X.W.; Ma, T.P.
文件大小188.27KB
发表时间1998
DOI10.1109/vlsit.1998.689263
页码218-219

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