Quantitative interpretation of electron-beam-induced current grain boundary contrast profiles with application to silicon
Corkish, Richard; Puzzer, Tom; Sproul, A. B.; Luke, Keung L.
- 期刊名称Journal of Applied Physics
- 作者Corkish, Richard; Puzzer, Tom; Sproul, A. B.; Luke, Keung L.
- 卷第84卷
- 期第10期
- 印刷ISSN0021-8979
- 文件大小426.35KB
- 发表时间1998
- DOI10.1063/1.368310