[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || Photoacid Diffusion in Chemically Amplified DUV Resists
- 作者Ito, Hiroshi; Reichmanis, Elsa; Nalamasu, Omkaram; Ueno, Takumi
- 文件大小1160.52KB
- 发表时间1998
- DOI10.1021/bk-1998-0706.ch009
- 页码110-125
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