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[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || Photoacid Generating Polymers for Surface Modification Resists

[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || Photoacid Generating Polymers for Surface Modification Resists

Ito, Hiroshi; Reichmanis, Elsa; Nalamasu, Omkaram; Ueno, Takumi

作者Ito, Hiroshi; Reichmanis, Elsa; Nalamasu, Omkaram; Ueno, Takumi
文件大小895.28KB
发表时间1998
DOI10.1021/bk-1998-0706.ch023
页码306-319

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