[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || Calixarene Resists for Nanolithography
- 作者Ito, Hiroshi; Reichmanis, Elsa; Nalamasu, Omkaram; Ueno, Takumi
- 文件大小897.06KB
- 发表时间1998
- DOI10.1021/bk-1998-0706.ch019
- 页码249-261
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