[ASCE STRESS INDUCED PHENOMENA IN METALLIZATION - Tokyo (Japan) (4-6 Jun 1997)] Fourth international workshop on stress induced phenomena in metallization - Electromigration failures under bidirectional current stress
Tao, Jiang; Cheung, Nathan W.; Hu, Chenming
- 作者Tao, Jiang; Cheung, Nathan W.; Hu, Chenming
- 文件大小774.84KB
- 发表时间1998
- DOI10.1063/1.54686
- 页码201-211