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Characterization of the silicon nitride–thermal oxide interface in oxide–nitride–oxide structures by ELS, XPS, ellipsometry, and numerical simulation

Characterization of the silicon nitride–thermal oxide interface in oxide–nitride–oxide structures by ELS, XPS, ellipsometry, and numerical simulation

V.A. Gritsenko; S.N. Svitasheva; I.P. Petrenko; Yu.N. Novikov; Yu.N. Morokov; Hei Wong; R.W.M. Kwok; R.W.M. Chan
  • 作者V.A. Gritsenko; S.N. Svitasheva; I.P. Petrenko; Yu.N. Novikov; Yu.N. Morokov; Hei Wong; R.W.M. Kwok; R.W.M. Chan
  • 卷第38卷
  • 期第5期
  • 印刷ISSN0026-2714
  • 文件大小329.75KB
  • 发表时间1998
  • DOI10.1016/s0026-2714(98)00019-5
  • 页码745-751
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