XRR and XPS studies of SiO2 thin films formed by r.f. magnetron sputtering
- 期刊名称Surface and Interface Analysis
- 作者Kojima, Isao; Li, Boquan; Fujimoto, Toshiyuki
- 卷第28卷
- 期第1期
- 印刷ISSN0142-2421
- 电子ISSN1096-9918
- 文件大小135.77KB
- 发表时间1999-08
- DOI10.1002/(sici)1096-9918(199908)28:1<267::aid-sia591>3.0.co;2-o
- 页码267-270
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PrefaceGRANT, JOHN T. · Surface and Interface Analysis · 1997
PrefaceFriedbacher, Gernot; Fuchs, Harold; G�untherodt, Hans-Joachim · Surface and Interface Analysis · 1997
PrefaceMarkwitz, A.; Matz, W.; Waldschmidt, M.; Demortier, G. · Surface and Interface Analysis · 1998
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EditorialBriggs (Editor-in-Chief), David · Surface and Interface Analysis · 1998
PrefaceVanden Eynde, X.; Bertrand, P. · Surface and Interface Analysis · 1999
PrefaceBennewitz, R.; Meyer, E. · Surface and Interface Analysis · 1999
EditorialBriggs, David · Surface and Interface Analysis · 1999