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Real time spectroscopic ellipsometry studies of the nucleation and growth of p-type microcrystalline silicon films on amorphous silicon using B2H6,B(CH3)3 and BF3 dopant source gases

Real time spectroscopic ellipsometry studies of the nucleation and growth of p-type microcrystalline silicon films on amorphous silicon using B2H6,B(CH3)3 and BF3 dopant source gases

Koh, Joohyun; Fujiwara, H.; Koval, R. J.; Wronski, C. R.; Collins, R. W.

期刊名称Journal of Applied Physics
作者Koh, Joohyun; Fujiwara, H.; Koval, R. J.; Wronski, C. R.; Collins, R. W.
卷第85卷
期第8期
文件大小1065.02KB
发表时间1999
DOI10.1063/1.370323

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