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[American Vacuum Soc 1999 4th International Symposium on Plasma Process-Induced Damage - Monterey, CA, USA (9-11 May 1999)] 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) - The sensitivity of electron shading damage to electron temperature, electron density and the plasma-to-wafer electron energy threshold

[American Vacuum Soc 1999 4th International Symposium on Plasma Process-Induced Damage - Monterey, CA, USA (9-11 May 1999)] 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) - The sensitivity of electron shading damage to electron temperature, electron density and the plasma-to-wafer electron energy threshold

Yamartino, J.M.; Loewenhardt, P.K.; Kenlin Huang, ; Hui Chen, ; Paterson, A.M.; Yan Ye, ; Helmsen, J.J.
  • 作者Yamartino, J.M.; Loewenhardt, P.K.; Kenlin Huang, ; Hui Chen, ; Paterson, A.M.; Yan Ye, ; Helmsen, J.J.
  • 文件大小193.32KB
  • 发表时间1999
  • DOI10.1109/ppid.1999.798802
  • 页码33-36
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