InP/InxGa1−xAs (0.53⩽x⩽0.81) high electron mobility transistor structures grown by solid source molecular beam epitaxy
K Radhakrishnan; T.H.K Patrick; H.Q Zheng; P.H Zhang; S.F Yoon
- 作者K Radhakrishnan; T.H.K Patrick; H.Q Zheng; P.H Zhang; S.F Yoon
- 卷第207卷
- 印刷ISSN0022-0248
- 文件大小151.09KB
- 发表时间1999
- DOI10.1016/s0022-0248(99)00353-x
- 页码8-14